Nano-Integration Devices and Systems
Laboratory for Nanoelectronics and Spintronics,
Research Institute of Electrical Communication, Tohoku University

SatoSakurabaYamamoto lab.

Development of next-generation device and process technologies
to support the coming super-smart society (Society 5.0)

Research Outline

In addition to the conventional demands such as faster operation and larger throughput, low power operation for low-carbon emission and robust operation not damaged even in a disaster are required for the development of the next generation information technology. To meet these demands, studies on high functional and high performance Si-based semiconductor devices realized by 3-D nano-processing and large scale integration of such devices are important research subjects. We study the subjects such as new transistors and memories using new materials, new devices based on new principles like quantum effects, and required 3-D processing. Moreover, we develop advanced technologies related to 3-D nano-integration, dependable mixed signal LSI, and non von Neumann architecture.

Latest News

  • 2024.04.14The members have been updated.
  • 2024.01.04The members have been updated.
  • 2023.04.13The laboratory name was changed and the members were updated.
  • 2022.04.07The members were updated.
  • 2022.03.01The website was renewed.
  • 2020.09.20The members were updated.
  • 2020.01.30The members were updated.
  • 2019.06.21The members were updated.
  • 2018.06.10The members were updated.
  • 2017.07.14The members were updated.
  • 2016.05.23The members werw updated.
  • 2015.09.23The members were updated.
  • 2014.09.30This home page was open.
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